Welcome to CIP MIATEC 2017
The 21st International Colloquium on Plasma processes (CIP) will be held jointly with the 5th Magnetron Ion processing & Arc Technologies European Conference (MIATEC) in Nice, France under the sun of the French Riviera, from June 26 to 30, 2017. Both, CIP and MIATEC are biennial international conferences, organized by the French Vacuum Society (SFV) and devoted to the latest developments in plasma processing science and technology.
CIP provides an opportunity to present recent progress in the field of plasma processes from fundamental research to applications. The aim of the colloquium is to highlight some of the latest developments, recent issues and challenges for plasma processes in various industrial fields, such as: surface treatments, nanoscience, energy and environmental technology or life sciences.
MIATEC focuses on the advances in fundamental research and understanding of all PVD (Physical Vapor Deposition) processes treating a large panel of subjects from sputtering in noble and reactive atmosphere, to arcs and ion processing and finishing with thin film deposition and surface processing by PVD (Ion Beam Assisted Deposition, non-equilibrium low current arc discharges and HiPIMS – High-Power Impulsed Magnetron Sputtering).
This joint event will include plenary lectures, invited and keynotes conferences, as well as regular communications given as oral or as poster. Short courses on plasma science, PVD and related technologies are proposed as Tutorials, prior to the conference. These activities are scheduled during three days for the conference and one day for Tutorials aiming to improve the basic knowledge in the field and make a status of the research in the field of plasmas.
||Call for papers
|2 April 2017
||Deadline (extended) for Abstract submission
||Opening of the registrations
||Deadline for Award & Prize application
||Short list for Student Award
||Extra cost for late registration
||Closing of the registrations